Comparison of hafnium oxide films grown by atomic layer ...,Request PDF | Comparison of hafnium oxide films grown by atomic layer deposition ... plasma-enhanced atomic layer deposition of HfO2/Al2O3 nanolaminate ...
Growth and Properties of Hafnicone and HfO2/Hafnicone ...,9 Sep 2014 ... Molecular layer deposition (MLD) of the hafnium alkoxide polymer ... HfO2/hafnicone nanolaminate films also were fabricated using HfO2 ...
Properties of HfO2/La2O3 nanolaminate films grown on an ...,Thus, by combining the benefits of Hf- and La-based oxide, HfO2/La2O3 nanolaminates have shown a permittivity of 28 and leakage of 1 mA cm−2 (film ...
Atomic Layer Deposition, Characterization, and Dielectric ...,22 Mar 2006 ... Abstract Nanolaminates of HfO2 and SiO2 were prepared using atomic layer ... maintained at 120 or 160 °C to nitrogen flows containing Hf(NO3).
Atomic Layer Deposition and Properties of HfO2-Al2O3 ...,6 Sep 2018 ... Nanocrystalline HfO2:Al2O3 mixture films and nanolaminates were grown ... als HfO2, Hf-Al-O and Al2O3 have been compared in metal-oxide-.
Tetrakis(dimethylamido)hafnium(IV) packaged for use in ...,Used as precursor for atomic layer deposition of Hafnium Oxide nanolaminates, which are used as a reploacement for Silicon oxide in semiconductor devices.
Engineering of Ferroelectric HfO 2-ZrO 2 Nanolaminates,19 Apr 2017 ... In this work, the ferroelectric properties of nanolaminates made of HfO 2 and ZrO 2 were studied as a function of the deposition ... Keywords: ferroelectrics; hafnium oxide; nanolaminates; nonvolatile memory; wake up.
Electrical characterization of atomic-layer-deposited hafnium ...,mality, density, and dielectric performance.9,10 Hafnium hal- ides, such as HfCl4, have been widely used as precursors for. ALD of HfO2. However, it has been ...
Nanolaminate Coatings to Improve Long-Term Stability of ...,9 May 2017 ... In this research Atomic Layer Deposited Aluminum Oxide and Hafnium Oxide nanolaminate structures are explored to increase the long-term ...
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